Publications

161 bis 170 von 284 Einträgen

Strehle, S.; Menzel, S.; Wetzig, K.; Bartha, J.W.: Microstructure of electroplated Cu(Ag) alloy thin films. In: Thin Solid Films 519 (2011), Nr. 11, S. 3522–3529

Strehle, S.; Schmidt, D.; Albert, M.; Bartha, J.W.: Growth of the Initial Atomic Layers of Ta-N Films During Atomic Layer Deposition on Silicon-Based Substrates. In: Chemical Vapor Deposition 17 (2011), S. 37–44

Naumann, A.; Kelwing, T.; Trentzsch, M.; Kronholz, S.; Kammler, T.; Flachowsky, S. ; Herrmann, T.; Kücher, P.; Bartha, J.W.: SiGe channels for higher mobility CMOS devices. In: MRS Proceedings 1194E (2010), S. 26–33

Junige, M.; Knaut, M.; Geidel, M.; Albert, M.; Bartha, J.W.: In-situ spectroscopic ellipsometry during the atomic layer deposition of ruthenium and ruthenium oxide. In: 3rd NanoCharm Workshop on Non-Destructive Real Time Process Control. Berlin, 2010 (2010)

Hossbach, C.; Henke, T.; Gatineau, J.; Zauner, A.; Strehle, S.; Knaut, M.; Bertram, M.; Geidel, M.; Schmiegel, C.; Albert, M.; Gluch, J.; Neidhardt, J.; Bartha, J.W.: Evaluation of the Novel Iridium Precursor Ir(EtCp)(MeCHD) for ALD of Iridium Thin Films. In: Proceeding of Baltic ALD / GerALD Conference 2010, Hamburg, Germany (2010) (2010)

Parshina, L.S.; no, O.A.; Panchenko, V.Ya.; Khramova, O.D.; Cherebilo, Ye.A.; Lotin, A.A.; Wenzel, C.; Trumpaicka, N.; Bartha, J.W.: Optical properties of nitrogen and phosphorus doped ZnO thin films fabricated by PLD method. In: Proceedings of X International Conference "Laser and Laser-Information Technologies: Fundamental Problems and Applications" (ILLA’2009, Smolyan, Bulgaria, 2009). Plovdiv, Bulgaria (2010), S. 109–115

Parshina, L.S.; Novodvorsky, O.A.; Panchenko, V.Ya.; Khramova, O.D.; Cherebilo, Ye.A.; Lotin, A.A.; Zuev, D.A.; Khaydukov, E.V.; Wenzel, C.; Trumpaicka, N.; Bartha, J.W.: Electric and optical properties of phosphorus doped (Zn,Mg)O thin films fabricated by pulsed laser deposition. In: Book of abstract of the 18th International Conference on Advanced Laser Technologies (ALT’10), Egmond aan Zee, the Netherlands, 11-16 September 2010 (2010), S. 148

Lotin, A.A.; Novodvorsky, O.A.; Khaydukov, E.V.; Glebov, V.N.; Rocheva, V.V.; Khramova, O.D.; Panchenko, V.Ya.; Wenzel, C.; Trumpaicka, N.; Chtcherbachev, K.D.: Epitaxial growth and properties of MgxZn1-xO films produced by pulsed laser deposition. In: Semiconductors 44 (2010), Nr. 2, S. 246–250

Лотин, A.A.; Новодворский, O.A.; Хайдуков, E.B.; Рочева, B.B.; Храмова, О.Д.; Панченко, В.Я.; Венцель, K.; Трумпайска, H.; Щербачев, К.Д.: Эпитаксиальный рост и свойства пленок MgxZn1-xO, получаемых методом лазерно-плазменного осаждения. In: Физика и Техника Полупроводников 44 (2010), Nr. 2, S. 260–264

Graham, A.P.; Richter, K.; Jay, T.; Weber, W.; Knebel, S.; Schröder, U.; Mikolajick, T.: An investigation of the electrical properties of metal-insulator-silicon capacitors with pyrolytic carbon electrodes. In: Journal of Applied Physics 108, Issue 10, 104508 (2010) (2010)

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Martin Knaut
Last modified: Oct 05, 2022