Publications

171 bis 180 von 284 Einträgen

Richter, K.; Kubasch, C.; Bartha, J.W.: Investigation of the influence of oxygen plasma on the copper surface. In: Posterbeitrag zur 12th International Conference on Plasma Surface Engineering PSE 2010 13. - 17. 9. 2010, Garmisch-Partenkirchen; Proceedings PSE 2010 (2010)

Strehle, S.; Menzel, S.; Bartha, J.W.; Wetzig, K.: Electroplating of Cu(Ag) thin films for interconnect applications. In: Microelectronic Engineering 87 (2010), S. 180–186

Rose, M.; Niinistö, J.; Endler, I.; Bartha, J.W.; Kücher, P.; Ritala, M.: In Situ Reaction Mechanism Studies on Ozone-Based Atomic Layer Deposition of Al2O3 and HfO2. In: Applied Materials & Interfaces 256 (2010), Nr. 2, S. 347–350

Rose, M.; Bartha, J.W.; Endler, I.: Temperature dependence of the sticking coefficient in atomic layer deposition. In: Applied Surface Science 256 (2010), S. 3778–3782

Neuner, J.; Zienert, I.; Peeva, A.; Preusse, A.; Kücher, P.; Bartha, J.W.: Microstructure in copper interconnects - Influence of plating additive concentration. In: Microelectronic Engineering 87 (2010), S. 254–257

Ostermay, I.; Kammler, T.; Bartha, J.W.; Kücher, P.: Enhancing epitaxial SixC1_x deposition by adding Ge. In: Thin Solid Films 518 (2010), S. 2834–2838

Knaut, M.; Geidel, M.; Krause, M.; Albert, M.; Bartha, J.W.: Ultra-thin AlxTi1-xOy films deposited by atomic layer deposition for DRAM capacitors and quantum devices. In: Proceeding of Nanofair Conference 2010, Dresden, Germany (2010)

Junige, M.; Knaut, M.; Geidel, M.; Albert, M.; Bartha, J.W.: In-situ characterization of ruthenium and ruthenium dioxide film growth. In: Proceeding of Baltic ALD / GerALD Conference 2010, Hamburg, Germany (2010)

Knaut, M.; Geidel, M.; Junige, M.; Krause, M.; Albert, M.; Bartha, J.W.: In-situ analysis of ultra thin ALD capacitor stacks for novel applications. In: Proceeding of AVS ALD Conference 2010, Seoul, Korea (2010)

Zimmermann, T.; Strobel, C.; Albert, M.; Beyer, W.; Gordijn, A.; Flikweert, A.J.; Kuske, J.; Bartha, J.W.: Inline deposition of microcrystalline silicon solar cells using a linear plasma source. In: Phys. Status Solidi C 7 (2010), Nr. 3-4, S. 1097–1100

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Martin Knaut
Last modified: Oct 05, 2022