Publications

241 bis 250 von 284 Einträgen

Schmidt, D.; Hossbach, C.; Menzel, S.; Thomas, J.; Teichert, S.; Hintze, B.; Wilde, L.; Albert, M.; Bartha, J.W.: Atomic Layer Deposition of Tantalum Nitride Based Thin Films. In: Agent. Proc. MAM Conf., Dresden (D) avail, online (2008)

Schmidt, D.; Strehle, S.; Albert, M.; Hentsch, W.; Bartha, J.W.: Top Injection Reactor Tool with in situ Spectroscopic Ellipsometry for growth and characterization of ALD thin films. In: Microelectronic Engineering 85 (2008), S. 527–533

Hossbach, C.; Schmidt, D.; Albert, M.; Adolphi, B.; Bartha, J.W.: Remote Plasma Enhanced Atomic Layer Deposition of Tantalum Nitride using TBTDET and Atomic Hydrogen. In: Baltic ALD Conference, Oslo, Norwegen (2007)

Strobel, C.; Zimmermann, T.; Albert, M.; Bartha, J.W.; Beyer, W.; Kuske, J.: Investigation on layer properties of amorphous and microcrystalline silicone deposited with moving substrates in combination with a VHF Linear Plasma Source designed for the fabrication of large area devices. In: 22rd European Photovoltaic Solar Energy Conference, 3.-7. Sept. 2007, Mailand, Italy (2007)

Wojcik, H.; Friedemann, M.; Feustelt, F.; Albert, M.; Ohsiekt, S.; Metzgert, J.; Voss, J.; Bartha, J.W.; Wenzel, C.: A Comparative study of thermal and plasma enhanced ALD Ta-N-C films on SiO(sub 2), SiCOH and Cu substrates. In: 10th International Interconnect Technology Conference, Burlingame, CA, 3-6 June 2007 IEEE 2007/ISBN 1-4244-1069-X (2007), S. 17–19

Richter, K.; Zschätzsch, G.; Bartha, J.W.: Positve etch profiles in silicon with improved pattern quality. In: Plasma Process. Polym. 4 (2007)

Novodvorsky, O.A.; Panchenko, V.Ya.; Sokolov, V.I.; Kharmova, O.D.; Gorbatenko, L.S.; Cherebilo, Ye.A.; Wenzel, C.; Bartha, J.W.; Hiemann, H.; Bublik, V.T.; Chtcherbatchev, K.D.: Structural characteristics and photoluminescence spectra of ZnO films produced by pulsed laser deposition. In: ICONO/LAT-2007, Minsk (BY) ohne Abdruck (2007)

Novodvorsky, O.A.; Kharmova, O.D.; Panchenko, V.Ya.; Gorbatenko, L.S.; Cherebilo, Ye.A.; Batishev, G.A.; Wenzel, C.; Bartha, J.W.; Bublik, V.T.; Hiemann , E.: Laser Plasma Deposition of thin ZnO films, doped by nitrogen. In: Int. Conf. Micro- & Nano-Electr., Zvenigorod (RU) ohne Abdruck (2007)

Hossbach, C.; Albert, M.; Teichert, S.; Hintze, B.; Mühle, U.; Wilde, L.; Bartha, J.W.: Plasma-Enhanced Atomic Layer Deposition of High Quality Tantalum Carbonitride Thin Films. In: Proc. AVS ALD Conf., San Diego (US) ohne Abdruck (2007)

Albert, M.: Atomlagenabscheidung (ALD) mit der Clusteranlage FHR – ALD 300. In: Silicon Saxony Tag, Dresden ohne Abdruck (2007)

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Martin Knaut
Last modified: Oct 05, 2022