Vacuum Technology
OPAL: https://bildungsportal.sachsen.de/opal/auth/RepositoryEntry/5690753028/CourseNode/88474264285643?42
Prof. Dr. rer. nat. J. W. Bartha
Objectives:
Vacuum processing is dominating thin film processing in semiconductor technology. The objetive of this lecture is to make the students familiar with the required fundamentals of vacuum. This includes gas kinetics, vacuum and gas flow ranges, pumping concepts and equipment, as well as vacuum measurement and mass spectroscopy. The obtained know how enables the basic understanding of the physics of many thin film techniques.
Tuesday 16:40 (4:40 p.m.)., SE2/0201/H
Start of the lecture: Tuesday Oct. 12’th 16:40
Lecture slides (download)